Book description
A Unified Summary of the Models and Optimization Methods Used in
Computational Lithography
Optical lithography is one of the most challenging areas of current
integrated circuit manufacturing technology. The semiconductor
industry is relying more on resolution enhancement techniques (RETs),
since their implementation does not require significant changes in
fabrication infrastructure. Computational Lithography is the
first book to address the computational optimization of RETs in
optical lithography, providing an in-depth discussion of optimal
optical proximity correction (OPC), phase shifting mask (PSM), and
off-axis illumination (OAI) RET tools that use model-based
mathematical optimization approaches.
The book starts with an introduction to optical lithography systems,
electric magnetic field principles, and the fundamentals of
optimization from a mathematical point of view. It goes on to describe
in detail different types of optimization algorithms to implement
RETs. Most of the algorithms developed are based on the application of
the OPC, PSM, and OAI approaches and their combinations. Algorithms
for coherent illumination as well as partially coherent illumination
systems are described, and numerous simulations are offered to
illustrate the effectiveness of the algorithms. In addition,
mathematical derivations of all optimization frameworks are presented.
The accompanying MATLAB® software files for all the RET methods
described in the book make it easy for readers to run and investigate
the codes in order to understand and apply the optimization
algorithms, as well as to design a set of optimal lithography masks.
The codes may also be used by readers for their research and
development activities in their academic or industrial organizations.
An accompanying MATLAB® software guide is also included. An
accompanying MATLAB® software guide is included, and readers can
download the software to use with the guide at ftp://ftp. wiley. com/public/sci_tech_med/computational_lithography.
Tailored for both entry-level and experienced readers,
Computational Lithography is meant for faculty, graduate
students, and researchers, as well as scientists and engineers in
industrial organizations whose research or career field is
semiconductor IC fabrication, optical lithography, and RETs.
Computational lithography draws from the rich theory of inverse
problems, optics, optimization, and computational imaging; as such,
the book is also directed to researchers and practitioners in these
fields.
Dr. Xu Ma received a PhD in electrical and
computer engineering from the University of Delaware. He is now with
the Electrical Engineering and Computer Science Department at the
University of California at Berkeley. Dr. Ma's research interests
include computational imaging, signal processing, and computational lithography.
Dr. Gonzalo R. Arce received a PhD degree in electrical
engineering from Purdue University. He is the Charles Black Evans
Distinguished Professor of Electrical and Computer Engineering at the
University of Delaware and holds the Fulbright-Nokia Distinguished
Chair in Information and Communications Technologies. Dr. Arce's
fields of interest include nonlinear and statistical signal
processing, digital printing, and computational imaging. He is a
Fellow of the IEEE for his contributions to the theory and
applications of nonlinear signal processing.
